Magnetron Discharge with Liquid-Phase Cathode

This research investigated the influence of the target phase state on the cathode sputtering yield in the bombardment of argon ions and ions of the target material. The experiments conducted on the magnetron sputtering system with aluminum and copper cathodes demonstrated the ability of magnetron sputtering systems to work with a liquid metal cathode. As a result, we showed the possibility of working with a liquid metal copper cathode in the self-sputtering mode. Moreover, we investigated the dynamics of changing the magnetron discharge voltage in the mode during the cathode material phase transition from a solid to a liquid state. Finally, we estimated the values of the cathode sputtering yield of these materials, adjusted for thermal evaporation and demonstrated the tendency to increase the cathode sputtering yield with the phase transition from a solid to a liquid state

References

[1] Danilin B.S., Syrchin V.K. Magnetronnye raspylitelnye sistemy [Magnetron sputtering systems]. Moscow, Radio i svyaz Publ., 1982. 72 p.

[2] Kuzmichev A.I. Magnetronnye raspylitelnye sistemy. Kn. 1. Vvedenie v fiziku i tekhniku magnetronnogo raspyleniya [Magnetron sputtering systems. P. 1. Introduction to the physics and technology of magnetron sputtering]. Kiev, Avers Publ., 2008. 244 p.

[3] Dukhopelnikov D.V. Magnetronnye raspylitelnye sistemy. V 2 ch. Ch. 1. Ustroystvo, printsipy raboty, primenenie [Magnetron sputtering systems. P. 1. Construction, principles of operation and application]. Moscow, Bauman MSTU Publ., 2014. 55 p.

[4] Danilin B.S., Kakurin M.V., Minaychev V.E., Odinokov V.V., Syrchin V.K. Metal films deposition by diffusion from liquid phase. Elektronnaya tekhnika. Ser. Mikroelektronika, 1978, no. 2, pp. 84–87 (in Russ.).

[5] Gvozdev V.V. Issledovanie magnetronnykh raspylitelnykh sistem s zhidkometallicheskim katodom s tselyu uvelicheniya proizvoditelnosti i snizheniya energozatrat protsessa katodnogo raspyleniya. Dis. kand. tekhn. nauk [Investigation of magnetron sputtering systems with liquid-metal cathode in order to increase performance and reduce energy consumption of cathode sputtering process. Cand. tech. sci. diss.]. Moscow, Bauman MSTU Publ., 1999. 131 p. (in Russ.).

[6] Bleykher G.A., Krivobokov V.P. Eroziya poverkhnosti tverdogo tela pod deystviem moshchnykh puchkov zaryazhennykh chastits [Erosion of a solid body surface under impact of powerful charged particle beams]. Novosibirsk, Nauka Publ., 2014. 248 p.

[7] Tumarkin A.V., Khodachenko G.V., Kaziev A.V., Shchelkanov I.A., Stepanova T.V. Magnetron discharge with a melted cathode. Uspekhi prikladnoy fiziki [Advances in Applied Physics], 2013, vol. 1, no. 3, pp. 276–282 (in Russ.).

[8] Marakhtanov M.K., Dukhopelnikov D.V., Vorobyev E.V., Kirillov D.V. Tribological properties of silver coatings made with magnetron sputtering system. Nanoinzheneriya [Nano Engineering], 2014, no. 9 (39), pp. 30–32 (in Russ.).

[9] Marakhtanov M.K., Ponkratov A.B. The low-pressure discharge in metal vapor of its own cathode. Pisma v ZhTF, 1989, vol. 15, no. 4, pp. 91–94 (in Russ.).

[10] Maissel L., Glang R. Handbook of thin film technology. New York, McGraw-Hill Book Company, 1970. 800 p.

[11] Groszkowski J. Technika wysokiej prózni. Warszawa, Wydawnictwa naukowo-techniczne, 1972. 564 s.

[12] Elistratov N.G. Eksperimentalnoe modelirovanie vzaimodeystviya plazmy izotopov vodoroda s elementami stenki reaktora ITER. Dis. kand. tekhn. nauk [Experimental simulation of interaction of hydrogen isotopes plasma with wall elements of ITER reactor. Cand. tech. sci. diss.]. Moscow, 2004. 194 p. (in Russ.).

[13] Khokhlov Yu.A. Plazmennye uskoriteli s azimutalnym dreyfom elektronov dlya polucheniya tonkikh opticheskikh plenok. Dis. kand. tekhn. nauk [Plasma accelerators with azimuthal electron drift producing thin optical films. Cand. tech. sci. diss.]. Moscow, Bauman MSTU Publ., 1987. 254 p. (in Russ.).